Effects of growth pressure on the characteristics of the -Ga<sub>2</sub>O<sub>3</sub> thin films deposited on (0001) sapphire substrates

Tao Zhang,Yifan Li,Qian Feng,Yachao Zhang,Jing Ning,Chunfu Zhang,Jincheng Zhang,Yue Hao
DOI: https://doi.org/10.1016/j.mssp.2020.105572
IF: 4.1
2021-01-01
Materials Science in Semiconductor Processing
Abstract:beta-Ga2O3 films were grown on (0001) sapphire substrates by low-pressure MOCVD. The effects of growth pressure on the growth rate, surface morphology and optical properties of beta-Ga2O3 thin films were investigated. XRD showed that the beta-Ga2O3 films grown preferentially along the (-201) crystal plane family were obtained, and the increase in growth pressure led to a decrease in growth rate, consistent with the SEM results. AFM measurements indicated that the increase in growth pressure reduced the grain size and RMS roughness. Optical transmission spectroscopy demonstrated that the average transmittance of all films in the visible range exceeded 75%, and the optical bandgap at 20, 30 and 40 Torr were 4.95, 4.93 and 4.91 eV, respectively. XPS revealed that the Ga 2p peak and O 1s peak blue shift as the growth pressure. Through RT-Raman spectroscopy, the low-frequency and high-frequency Raman vibration modes of beta-Ga2O3 were detected.
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