Wear and Morphologies of the SiOx Film on Aluminum Substrate

ZHANG Ji-liang,WO Yin-hua,LI Jian,GAN Zheng-hao

DOI: https://doi.org/10.3969/j.issn.1673-2812.2005.03.028

2005-01-01

Abstract:SiOx thin film on aluminum substrate were prepared by Ambient Pressure Chemical Vapor Deposition(APCVD). The slide wear properties of the pure aluminum and SiOx film were studied by the antitheses in this report. The wear mechanism analysis and SEM morphologies demonstrated that the aluminum was inclined to wear by sticking friction. There are many plastic deformation and enfolded districts on the weared surface, which leads to the fact that the slice come off from pure aluminium surface and the wearing rate is high. The SiOx film is relatively high in hardness and some pores can be find by SEM. The collapsing zone could be observed in the SiOx film by SEM and the film was inclinged to wear by grain-abrasion. The abrasion rate of the SiOx film was also lower than the aluminum due to the interspaces were filled with water worked as the lubricant. With the prolonging of depositional time, the SiOx particles becamed larger and the wear loss reduced.