Rapid synthesis of organosilicon oxide thin films and post-curing for enhanced scratch and corrosion resistance of aluminum alloy

Yung-Sen Lin,Cheng-Yan Wu,Bing-Rong Wu,Gong-Min Zhang
DOI: https://doi.org/10.1016/j.vacuum.2023.112879
IF: 4
2023-12-13
Vacuum
Abstract:Organosilicon oxide (SiO x C y ) film deposited onto flexible aluminum (Al) alloy AA1050 substrate by an atmospheric pressure plasma jet and combined with post-curing in air at 150–300 °C for 30 min, is investigated to highly improve the scratch and corrosion resistance of Al substrate from a presence scratching up to 6.4 % after first scratch test (against #0000 steel wool at 100 g loading) and a corrosion rate up to 3.73 mm/Yr after immersed for 12 h (against in PH2-3.5 wt% NaCl–HCl aqueous solution) for the original Al substrate to a thorough deficiency of scratching (0 %) up to 140 scratch tests and a corrosion rate up to 0.0066 mm/Yr for Al/SiO x C y . The enhanced scratch and corrosion resistance of Al/SiO x C y are proven to be greatly dependent on their film properties, and surface characteristics of nano SiO x C y films and post-cured in air at 150–300 °C.
materials science, multidisciplinary,physics, applied
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