Preparation of Self-Healing Α-Al2o3 Film on Rapid Quenching Al-Cr Alloy by Thermal Oxidation at Low Temperature

蔡俊,张舟永,凌国平
DOI: https://doi.org/10.3785/j.issn.1008-973x.2013.02.020
2013-01-01
Abstract:To prepare self-healing α-Al2O3 film below 750 ℃,the oxidation of rapid quenching Al-Cr alloy with Cr contents of 8 % and 18 % at 670-720 ℃ in air was studied.The oxide film was analyzed by XRD,SEM,TEM and EDS.The results show that the w(Cr)=8 % sample is one-phase solid solution of Cr in Al,while the w(Cr)=18 % sample is constituted of Al and Al45Cr7 phases.A compact α-Al2O3 film is prepared at 720 ℃ by the oxidation of Al-Cr alloy and,the rapid quenching alloy substrate has no obvious influence on the morphologies and phase constitutions of the oxide films.A few Cr is found in the α-Al2O3 film when the Cr content is larger.Moreover,XRD result shows that coarse surface facilitates the formation of the α-Al2O3.
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