Highly Adhesive SiOx Film on Aluminum Alloys Prepared by CVD Processes

刘涛,郦剑,沈复初,王幼文

DOI: https://doi.org/10.3969/j.issn.1009-6264.2002.04.010

2002-01-01

Abstract:The silicon oxide films on aluminum alloys matrix were prepared by chemical vapor deposition (CVD) in ambient pressure. The morphology, composition and microstructural characteristic of the film were tested by SEM,XPS and TEM technologies respectively, The adhesive property of the film was measured with the 180° and 90° bending test and the 450℃ thermal shock test. The results prove that the film possesses a high bonding strength with the substrate.