Study on the array type high power thin film resistance termination

Zhongdong JIANG,Wanli ZHANG,Bin PENG,Senyang DENG,Hongchuan JIANG
DOI: https://doi.org/10.14106/j.cnki.1001-2028.2014.12.007
2014-01-01
Abstract:A thin film resistance termination with array structure were designed based on power divider and simplified real frequency method. The array resistance termination operates at DC-20GHz with 40W applied power. The designed TaN thin film resistance termination was fabricated by screen printing method and RF magnetron sputtering. The properties of prepared termination were studied. The results show the VSWR of the termination is less than 1.3 within the frequency range of DC-23.6 GHz. When the resistance termination is loaded with power of 8, 18 and 40 W, the maximum surface temperature of the thin film resistance termination is about 37.6 , 59.5 and 113.6℃, respectively. Thermal imaging results show that the two resistive films of the resistance termination exhibit the same temperature distribution, which suggests that the input microwave power is divided averagely by the two resistive film resistances.
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