Abstract:Channel fabrication technology has become increasingly important for microfluidic and nanofluidic devices. In particular, glass channels have high chemical and physical stability, high optical transparency, and ease of surface modification, so that there is increasing interest in glass microfluidic devices for chemical experiments in microfluidics and nanofluidics. For the fabrication of glass channels, especially those with a high aspect ratio (depth/width), lithography using a metal resist and dry etching have mainly been used. However, there are still issues involving the surface roughness of the etched channel and the low etching selectivity. In this study, a microchannel fabrication method with high etching selectivity that produces a smooth etched surface was developed. First, interference during dry etching by remaining Cr particles after the photolithography and Cr etching processes was assumed as the cause of the rough etched surface. Three different dry etching processes were introduced to verify this. In process 1 without removal of the Cr particles, the etched surface was not flat and had a 1 μm scale roughness. In process 2 where a cleaning process was included and high power etching was conducted, a smooth surface with a 1 nm scale roughness and a faster etching rate of 0.3 μm/min were obtained. For this high-power etching condition, the etching selectivity (fused silica/Cr) was relatively low at approximately 39-43. In process 3 with a cleaning process and low-power etching, although the etching rate was relatively low at 0.1 μm/min, a smooth surface with 1 nm scale roughness (10 nm scale roughness deeper than 40 μm in the depth region) and a much higher etching selectivity of approximately 79-84 were obtained. The dry etching method presented in this study represents a significant contribution to microfluidics/nanofluidics for microchannel/nanochannel fabrication.

Experiment on immersion chemical etching technology of fluid micro-channels

Micro Etching Method Inside Microchannels

Flow-restricted Etching Method on Isotropic Substrates and Its Mechanism

Study On Characteristics Of Interface Between Multiple Laminar Streams And Application For Secondary Etching Inside Microchannels

Micro Fabrication of Micro Fluidic Glass Chip Without Clean Room Condition

Stress-Etching Using Laser Electrochemical Micromachining with Masks

Experimental Research on CO_2 Laser Direct-writing Machining PMMA Microchannel

Study on chemical spray etching of stainless steel for printed circuit heat exchanger channels

Investigation on Laser Etch-Machining Underwater Based on Thermal-Mechanical Effect

Research Status and Progress of Contamination Control in Immersion Liquid System of Immersion Lithography Machine

Chemical Etching Processes at the Dynamic GaAs/Electrolyte Interface in the Electrochemical Direct-Writing Micromachining

A Novel Restricted-Flow Etching Method for Glass

Experimental Study on the Hot Embossing Polymer Microfluidic Chip

Fabrication of Micro/Nanofluidic Chip on Glass Substrate and Its Application for Electrokinetic Concentration of Proteins

Spray Etching Rate Development of Stainless Steel in the Etchant for Printed Circuit Heat Exchanger Channels

Experimental Study on Spray Etching of Printed Circuit Heat Exchanger Channels

Effective Approaches to Improve Au Etching Process Performance in MEMS Devices

Two-Dimensional Chemical Etching Process Simulation for Printed Circuit Heat Exchanger Channels Based on Cellular Automata Model

Fused silica microchannel fabrication with smooth surface and high etching selectivity

Study on the Influence of Etchant Composition and Etching Process on the Precision of Stainless‐Steel Microchannel and Etching Mechanism

An experimental study on the side-opening filling process at the interface between microchannels with different widths