Defects in SOI Materials and Related Characterization

Qingfeng XIA,Deren YANG,Xiangyang MA,Duanlin QUE
DOI: https://doi.org/10.3321/j.issn:1005-023x.2007.03.033
2007-01-01
Abstract:The peculiar defects in silicon on insulator(SOI)material separated by implant oxygen(SIMOX)are described,such as surface defects,Si/SiO2 interface defects and some defects in buried oxide.The formation mechanism and characterization of these defects are addressed.Moreover,the countermeasures to reduce and eliminate the defects in SOI are also introduced.
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