Abstract:Nb-doped (2.5wt%) TiO2 thin films was deposited on glass substrate by DC magnetron sputtering from a ceramic target and the films thickness was controlled in the range from 300 nm to 350 nm. The structure, surface morphology and optical properties of the films deposited at different substrate temperatures were investigated by X-ray diffraction, scanning electron microscope, and optical transmission spectroscope. The films deposited at 150 degrees C, 250 degrees C and 350 degrees C were amorphous, anatase and rutile, respectively. The grain size of the typical anatase film deposited at 250 degrees C reached the maximum of 32 nm. The roughness of the films decreased and their density increased with the rising of substrate temperature. The average optical transmittance of films were around 70% when the substrate temperatures were below 250 degrees C. As the substrate temperature were risen to 350 degrees C, the films' transmittance dropped to 59%. It indicated that the transmittance of visible light was hindered by the rutile phase in the Nd-doped TiO2 films. The optical band gap of the films were in the range from 3.68 eV to 3.78 eV, and the optical band gap of the typical anatase film deposited at 250 degrees C reached the highest value of 3.78 eV.

Grain Size and Its Distribution in NiTi Thin Films Sputter-Deposited on Heated Substrates

Effect of Substrate Temperature on Crystallization Behavior of NiTi Thin Films

Grain Size Estimations of Annealed Ti–Ni Shape Memory Thin Films

The Behavior of Crystalline Grain Growth in TiNi Shape Memory Alloy Thin Films

Effect of substrate temperature on the surface and interface oxidation of NiTi thin films

Substrate Temperature Effect on Growth Behavior and Microstructure-Properties Relationship in Amorphous Ni-Nb Thin Films

FABRICATION AND CHARACTERIZATION OF FUNCTIONALLY GRADED Ni–Ti MULTILAYER THIN FILMS

Effect of Annealing Temperature on Surface Morphology and Mechanical Properties of Sputter-Deposited Ti–Ni Thin Films

In-Situ Tem Study of the Thickness Impact on the Crystallization Features of A Near Equal-Atomic Tini Thin Film Prepared by Planar Magnetron Sputtering

Studies on the Surface Morphology and Hydrophobic Property of Niti Thin Films under in Situ and Post Annealing Various Temperatures

Formation Of Nanocrystalline Tin Film By Ion-Beam-Enhanced Deposition

In-situ Crystalline TiNi Thin Films Deposited by HiPIMS at a Low Substrate Temperature

The Characterization of Crystalline Particle Growth in Tini Thin Films

Effect of Substrate Temperature on Microstructure and Mechanical Properties of Magnetron Sputtered TiN Thin Films

X-ray photoelectron spectroscopy analysis of the effect of thickness on the transformation temperature of NiTi alloy thin films

Structural Study of Sputtered Nanocrystalline Ti and Zr by X-ray Diffraction

Crystallization Kinetics of Niti Films with Different Ni Contents

Investigation on mechanical properties of sputtered TiNi thin films

Influence of the Substrate Temperature on the Properties of Nb-doped TiO_2 Films Deposited by DC Magnetron Sputtering

Transformations in sputter-deposited thin films of NiTi shape memory alloy

Deposition-rate dependence of orientation growth and crystallization of Ti thin films prepared by magnetron sputtering