Influence of the Substrate Temperature on the Properties of Nb-doped TiO_2 Films Deposited by DC Magnetron Sputtering

Huang Shuai,Li Chen-Hui,Sun Yi-Hua,Ke Wen-Ming
DOI: https://doi.org/10.3724/sp.j.1077.2012.00064
2012-01-01
Abstract:Nb-doped (2.5wt%) TiO2 thin films was deposited on glass substrate by DC magnetron sputtering from a ceramic target and the films thickness was controlled in the range from 300 nm to 350 nm. The structure, surface morphology and optical properties of the films deposited at different substrate temperatures were investigated by X-ray diffraction, scanning electron microscope, and optical transmission spectroscope. The films deposited at 150 degrees C, 250 degrees C and 350 degrees C were amorphous, anatase and rutile, respectively. The grain size of the typical anatase film deposited at 250 degrees C reached the maximum of 32 nm. The roughness of the films decreased and their density increased with the rising of substrate temperature. The average optical transmittance of films were around 70% when the substrate temperatures were below 250 degrees C. As the substrate temperature were risen to 350 degrees C, the films' transmittance dropped to 59%. It indicated that the transmittance of visible light was hindered by the rutile phase in the Nd-doped TiO2 films. The optical band gap of the films were in the range from 3.68 eV to 3.78 eV, and the optical band gap of the typical anatase film deposited at 250 degrees C reached the highest value of 3.78 eV.
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