Effect of Substrate Temperature on the Microstructure of TiO2 Thin Films and UV Photoelectric Properties

刘子丽,肖峻,蒋向东,孙继伟
DOI: https://doi.org/10.3969/j.issn.1005-9490.2010.02.001
2010-01-01
Abstract:In order to prepare the UV photoelectric characteristics of TiO2 thin films,TiO2 thin films on glass substrate were prepared by DC magnetron sputtering(DC) method at different substrate temperature.XRD,SEM,EDS were used to analyze crystal structure,surface topography and constituents.It was found that,when the substrate temperature was 250 ℃ and above,TiO2 thin films with anatase phase structure were prepared,and had a better stoichiometric ratio.The response time of TiO2 thin film resistors to UV irradiation was decreased with the substrate temperature.
What problem does this paper attempt to address?