Miscrostructure and Photoelectrical Performance of Titanium Oxide Film Prepared by In-Situ Oxidation on TiNi Alloy Surface
WANG Gai-tian,TU Jiang-ping,ZHANG Wen-kui,ZHANG Bo,YUAN Yong-feng,HUANG Hui,GAN Yong-ping
DOI: https://doi.org/10.3969/j.issn.1674-0475.2005.03.001
2005-01-01
Abstract:The preparation, structure and photoelectric properties of titanium oxide films formed by in-situ direct thermally oxidation of TiNi alloys were investigated by AFM ,XRD, EDS and photocurrent response. The results showed that the films is rutile TiO2, and its crystal orentation is dependent on the thermal oxidation temperature. With increasing the oxidation temperature, the photocurrent and open-circuit voltage of TiO2/TiNi electrode first increased, and then decreased. when the oxidation temperature was 700 ℃, the photocurrent of TiO2/TiNi electrode was the highest.