Miscrostructure and Photoelectrical Performance of Titanium Oxide Film Prepared by In-Situ Oxidation on TiNi Alloy Surface

WANG Gai-tian,TU Jiang-ping,ZHANG Wen-kui,ZHANG Bo,YUAN Yong-feng,HUANG Hui,GAN Yong-ping
DOI: https://doi.org/10.3969/j.issn.1674-0475.2005.03.001
2005-01-01
Abstract:The preparation, structure and photoelectric properties of titanium oxide films formed by in-situ direct thermally oxidation of TiNi alloys were investigated by AFM ,XRD, EDS and photocurrent response. The results showed that the films is rutile TiO2, and its crystal orentation is dependent on the thermal oxidation temperature. With increasing the oxidation temperature, the photocurrent and open-circuit voltage of TiO2/TiNi electrode first increased, and then decreased. when the oxidation temperature was 700 ℃, the photocurrent of TiO2/TiNi electrode was the highest.
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