A Study of Si1−xGex/Si Quantum-Well Intermixing by Photocurrent Spectroscopy

C Li,Qq Yang,Yh Chen,Hj Wang,Jz Wang,Jz Yu,Qm Wang
DOI: https://doi.org/10.1016/s0040-6090(99)00731-2
IF: 2.1
2000-01-01
Thin Solid Films
Abstract:Photocurrent spectroscopy has been used to study quantum-well intermixing in this paper. The cut-off wavelength of the photodiodes based on the implanted and annealed materials is significantly reduced, compared with that measured in annealed-only photodetectors. The bandgap of SiGe quantum well in implanted and annealed samples is blue-shifted by up to 97 meV, relative to that in annealed-only samples.
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