Abstract:Nanocomposite Ti-Al-Si-N films (Al content ranging from 0 to 16.7 at.% and Si from 0 to 11.8 at.%, respectively) were prepared on Si(100) substrates at 500'C by reactive close-field unbalanced magnetron sputtering in an Ar-N, mixture. The chemical composition, bonding structure, surface morphology, microstructure, stress and mechanical properties of these films were systematically investigated by means of energy dispersive spectrometry (EDS), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), X-ray diffraction (XRD), optical interference system and nanoindentation measurements.The XPS measurements reveal evolution of chemical composition and bonding structure of the deposited Ti-Al-Si-N films. The observed nonlinear peak shift of Ti 2p and N 1s indicates the bonding evolution of crystalline TiN. The spectra from Al 2p at 73.7 eV and Si 2p at 101.1 eV indicates the evolution of film composition from TiSiN to TiAlN with the incorporation of Al, and also implies that their chemical states are mainly in the form of SiNx and AlN, respectively. The (1 1 1) diffraction peak from the XRD theta-2 theta patterns shows a variation either on peak width or on peak position, indicating the variation of grain size and lattice constant. The calculated lattice constant reveals a mixture of different phases whose structures are similar to TiN. The nonlinear variation of grain size and lattice constant is considered due to the competition between two processes, i.e. Al addition and the underlying Si reduction. In order to further understand the microstructure evolution, the XRD spectra and corresponding calculations of the Ti-Al-Si-N films without heating during deposition are also shown for comparison. The effect of substrate heating is discussed. The present results show that the influence of Si and Al addition on the grain growth is different.The surface roughness of Ti-Al-Si-N films also exhibits a nonlinear variation, which is due to the variation of grain size and the competitive growth of different phases. The influence of stress on the hardness can be ignored due to its relatively low value (1-2 GPa) compared with the super-hardness of the films. All the quaternary Ti-Al-Si-N films show enhanced mechanical properties when compared with the nanocomposite Ti-Si-N and Ti-Al-N films deposited under the same condition. The best hardness, reaching superhard, is obtained for the Ti-AI-Si-N film with 7.5 at.% Al and 6 at.% Si. The combined effect of vacancy hardening and some of extrinsic hardening are considered responsible for the enhanced mechanical properties of Ti-Al-Si-N films. (c) 2006 Elsevier B.V. All rights reserved.

Structure and properties of Ti-Si-N nanocomposite films prepared by pulsed-DC plasma enhanced CVD

Growth and Mechanical Properties of Amorphous and Nanostructured SiC films

Superhard Nanocomposite Ti–Al–Si–N Films Deposited by Reactive Unbalanced Magnetron Sputtering

Microstructure, Surface Morphology, and Mechanical Properties of Nanocrystalline Tin/Amorphous Si3n4 Composite Films Synthesized by Ion Beam Assisted Deposition

Tribological Properties of CrSiN Nanocomposite Films

Properties of Ti-Si-N Nanocomposite Coatings Deposited by Closed-Field Unbalanced Magnetron Sputtering

Microstructure and Mechanical Properties of Ti Al Si N Nano-Composite Coatings Deposited by Ion Beam Assisted Deposition

Microstructure, Mechanical, and Tribological Properties of Cr-Ti-Si-N Coatings

Mechanical Properties of Nanocomposite TiN/Si3N4 Films Synthesized by Ion Beam Assisted Deposition (IBAD)

Microstructure, mechanical and tribological properties of TiCN nanocomposite films deposited by DC magnetron sputtering

Nanometer Grain Titanium Carbonitride Coatings with Continuously Graded Interface Onto Silicon Nitride Cutting Tools by Pulsed High Energy Density Plasma

Structure, Composition and Mechanical Properties of Reactively Sputtered (tivcrtaw)nx High-Entropy Films

The microstructure and mechanical properties of Ti(CoCr)N films produced by DC magnetron sputtering

Effects of silicon content on the structure and mechanical properties of (AlCrTaTiZr)–Si<sub><i>x</i></sub>–N coatings by reactive RF magnetron sputtering

Fractography, microstructure and thermal stability of multilayer CN x/TiN composite films prepared by DC reactive magnetron sputtering

Effects of silicon content on the structure and mechanical properties of (AlCrTaTiZr)–Six–N coatings by reactive RF magnetron sputtering

Microstructure and mechanical properties of CrN films fabricated by high power pulsed magnetron discharge plasma immersion ion implantation and deposition

Microstructure, Mechanical Properties, and Oxidation Resistance of Nanocomposite Ti–Si–N Coatings

Microstructure and Mechanical Properties of TiN/Si3N4 Nanocomposites by Spark Plasma Sintering (SPS)

Structural and Mechanical Properties of Multi-Element (alcrmotatizr)nx Coatings by Reactive Magnetron Sputtering

Effects of Silicon Content on the Microstructures and Mechanical Properties of (AlCrTiZrV)-Six-N High-Entropy Alloy Films