Properties of Ti-Si-N Nanocomposite Coatings Deposited by Closed-Field Unbalanced Magnetron Sputtering

C. H. Zhang,X. C. Lu,J. B. Luo,Y. G. Shen,K. Y. Li
DOI: https://doi.org/10.1115/wtc2005-63283
2005-01-01
Abstract:Ti-Si-N coatings with different silicon contents were deposited by reactive magnetron sputtering. These coatings were characterized and analyzed by using a variety of analytical techniques. The Ti-Si-N coating shows a denser structure as compared with TiN coating, and consists of TiN crystallites and amorphous Si3N4 phase. The maximum hardness and Young’s Modulus of 52 GPa and 360 GPa respectively are achieved as the Si content was 8.6 at.%. The Ti-Si-N coating with 8.6 at.% Si shows the excellent oxidation resistance behavior and perfect anti-wear performance.
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