Characterization of Microstructures and Properties of TiSiN Coatings Deposited by RF Magnetron Sputtering
zhao yongsheng,li wei,liu ping,ma fengcang,liu xinkuan,chen xiaohong,he daihua
DOI: https://doi.org/10.3969/j.issn.1672-7126.2014.03.10
2014-01-01
Abstract:The TiN/Si3N4 nano-composite coatingswere deposited by RF magnetron sputtering on silicon substrate. The impacts of the deposition conditions,such as the pressure,substrate temperature,ratio of N2and Ar flow rates,and sputtering power,on the microstructures and mechanical propertieswere evaluated.The composite coatingswere characterized with X-ray diffraction,scanning electron microscopy and mechanical probes.The results show that the pressure,substrate temperature,and ratio ofN2and Arflow rates significantly affect the microstructures and mechanical properties.For example, synthesized under the optimized conditions:a pressure of 0.4 Pa,a substrate temperature of 300°C, and a ratio of 5/38,the coatings have the maximum hardness of 34.4 GPa,Possible mechanisms responsible for the improvement of its mechanical propertieswerealso tentatively discussed.