Electronic transport properties in a-Si : H, mu c-Si : H and mu c-SiGe : H films studied by traveling wave method

K Chen,S Huang,J Xu,H Fritzsche,A Matsuda,G Ganguly
2002-01-01
Journal of optoelectronics and advanced materials
Abstract:We review our work on drift-mobility and electronic conduction measurements in a-Si:H, muc-Si:H and muc-SiGe:H films by traveling wave method. The change of transport mechanism in muc-Si:H films induced by H-2-diluted silane plasma was discussed and related to the microstructure. Also, we found that the crystallinity and grain size exerted a strong influence on the transport mechanism in muc-SiGe:H films. Especially with very high hydrogen dilution (R>300), both of conductivity and mobility came to decrease, which were different from that of normal muc-SiGe:H films. These novel phenomena were discussed by strong scattering of the potential barriers between the crystallites.
What problem does this paper attempt to address?