Conduction in a-Si:H studied by traveling wave technique

Kun-ji Chen,H. Fritzsche
DOI: https://doi.org/10.1016/0022-3093(83)90615-4
IF: 4.458
1983-01-01
Journal of Non-Crystalline Solids
Abstract:It appears that the traveling wave technique pioneered by Adler et al. probes the transport properties near the surfaces and not of the bulk. Neglecting surface states we obtain microscopic mobilities for electrons near the surface between 8 and 10 cm 2 /Vs in heavily doped n-type a-Si:H after annealing and after light-soaking. These values agree well with time-of-flight measurements on intrinsic material.
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