Magnetron sputtering system for depositing boron carbide film use as neutron detection
Jingtao Zhu,Yang Liu,Hangyu Zhu,Jianrong Zhou,Xiaojuan Zhou,Jie Zhu,Lin Zhu,Zhijia Sun,Yuanbo Chen,Mingqi Cui,Yunping Zhu,Changli Jin
DOI: https://doi.org/10.1063/5.0134473
IF: 1.6
2023-01-01
Review of Scientific Instruments
Abstract:Boron carbide (B4C) films used as neutron conversion layers were investigated in this paper to replace the traditional He-3 detectors due to their shortage. A magnetron sputtering system was developed for depositing large-size B4C films with the 1500 x 400 mm(2) uniform-area. B4C films at the micron scale were deposited on aluminum (Al), float glass (SiO2), and silicon (Si) substrates with an inserting adhesion layer. The key characteristics, including surface morphology, thickness nonuniformity, purity, and neutron efficiency of B4C films, were characterized using atomic force microscopy, scanning electron microscopy, grazing incidence x-ray reflectivity, x-ray photoelectron spectroscopy, and neutron radiation metrology. The experimental results indicate that the deposition thickness nonuniformity across a 1500 x 400 mm(2) area was better than +/- 3%. The stoichiometric ratio of boron atoms and carbon atoms (B/C) is 5.18, with 6 at.% O and 0.79 at.% N concentrations. The measured neutron detection efficiency of a 3 mu m (B4C)-B-10 film for 25 meV neutrons was 3.3 +/- 0.3(sys)%, which is close to the simulated results (3.4%). The results show that the B4C neutron conversion layer is a promising substitute for He-3 for neutron detection in the future.