2×2 Multimode Interference Coupler with Low Loss Using 248 Nm Photolithography

Patrick Dumais,Yuming Wei,Ming Li,Fei Zhao,Xin Tu,Jia Jiang,Dritan Celo,Dominic J. Goodwill,Hongyan Fu,Dongyu Geng,Eric Bernier
DOI: https://doi.org/10.1364/ofc.2016.w2a.19
2016-01-01
Abstract:We demonstrate a 2×2 multimode interference coupler in 220 nm silicon photonics, with 3.8 μm by 152 μm footprint. Loss is ≤0.15±0.01 dB for 1530-1565 nm, across the 200 mm wafer using 248 nm lithography. This is the lowest loss reported for sub-micron silicon 2×2 MMI.
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