Abstract:Oxygen ions (O + ) were implanted into fused silica at a fixed fluence of 1 × 10 17 ions/cm 2 with different ion energies ranging from 10 keV to 60 keV. The surface roughness, optical properties, mechanical properties and laser damage performance of fused silica were investigated to understand the effect of oxygen ion implantation on laser damage resistance of fused silica. The ion implantation accompanied with sputtering effect can passivate the sub-/surface defects to reduce the surface roughness and improve the surface quality slightly. The implanted oxygen ions can combine with the structural defects (ODCs and E′ centers) to reduce the defect densities and compensate the loss of oxygen in fused silica surface under laser irradiation. Furthermore, oxygen ion implantation can reduce the Si–O–Si bond angle and densify the surface structure, thus introducing compressive stress in the surface to strengthen the surface of fused silica. Therefore, the laser induced damage threshold of fused silica increases and the damage growth coefficient decreases when ion energy up to 30 keV. However, at higher ion energy, the sputtering effect is weakened and implantation becomes dominant, which leads to the surface roughness increase slightly. In addition, excessive energy aggravates the breaking of Si–O bonds. At the same time, the density of structural defects increases and the compressive stress decreases. These will degrade the laser laser-damage resistance of fused silica. The results indicate that oxygen ion implantation with appropriate ion energy is helpful to improve the damage resistance capability of fused silica components.

Interstitial O2 and Si-H Defects Produced in Fused Silica During Laser-Induced Damage

Laser-induced defects in fused silica by UV laser irradiation

Surface Molecular Structure Defects and Laser-Induced Damage Threshold of Fused Silica During a Manufacturing Process

The damage mechanisms of fused silica irradiated by 355nm laser in vacuum

Near-Infrared Femtosecond Laser Induced Defect Formation in High Purity Silica below the Optical Breakdown Threshold

Laser Induced Damage in Fused Silica for 248 nm

Bulk Damage and Stress Behavior of Fused Silica Irradiated by Nanosecond Laser

Absorption and luminescence spectroscopy of fused silica by multiple pulses irradiation at 355nm

Damage Induced 0n Fused Silica by Fundamental Frequency and Third Harmonic of Nd:YAG Laser

Optical Properties and Laser Damage Performance of Sio2 Irradiated by High-Power Pulsed Electron Beam

Ultra-Short Pulsed Laser-Induced Damage in Inorganic Silicon Materials

The Structure Evolution of Fused Silica Induced by CO 2 Laser Irradiation

Laser Induced Damage Characteristics of Fused Silica Optics Treated by Wet Chemical Processes

Laser-Induced Damage on Fused Silica with Photo-Acoustic Spectrum Analysis

Laser-damage Growth Characteristics of Fused Silica under 1064- and 532-Nm Laser Irradiation

The Infrared Spectra and Laser Damage Threshold of the Fused Silica after Megacoustic Field Assisted Hydrofluoric-Based Etching

Evolution of Point Defects in Mechanical Cracks of Fused Silica after CO2 Laser Melting

Surface Defects, Stress Evolution, and Laser Damage Enhancement Mechanism of Fused Silica under Oxygen-Enriched Condition

Femtosecond Laser Induced Defects in Various Silica Glasses

Micron-size bubble defects in fused silica and its laser induced damage near 355 nm

Damage Behaviors of Silica Microparticles on Fused Silica Optics under 355 Nm High Fluence Laser