Effects of Surface Migration on InGaN/GaN Multiple Quantum Wells Selectively Grown on Periodic Stripe Openings Separated by Large SiO2 Covered Spacing on Si (111) Substrates

Xiaobiao Han,Hui Luo,Hang Yang,Jie Chen,Changming Zhong,Jiezhi Liang,Jieying Xing,Zhisheng Wu,Yang Liu,Baijun Zhang
DOI: https://doi.org/10.1016/j.mssp.2018.05.040
IF: 4.1
2018-01-01
Materials Science in Semiconductor Processing
Abstract:InGaN/GaN multiple quantum wells (MQWs) were selectively grown on patterned GaN/AlN/Si (111) templates with periodic stripe openings separated by large SiO2 covered spacing. In comparison with the conventional epitaxial lateral overgrowth, the migration behaviours of group-III adatoms on the large mask region has a distinct effect on the structural and optical properties of InGaN/GaN MQWs selectively grown on the narrow stripe openings. In order to control them, a wide stripe window nearby the narrow one was adopted to modulate the local growth environments in our experiment. Flat and faceted InGaN/GaN MQWs stripes with trapezoidal cross section composed of basal (0001) plane and two semipolar {112̅2} facets were obtained. The optical properties were investigated by the microscopic photoluminescence (micro-PL) measurement. The difference in emission peak positions observed by scanning the excitation laser across the stripes is related to the surface migration behaviour of the group-III adatoms on the SiO2 masks.
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