Development Of 3.6 Kv 4h-Sic Pin Power Diodes

Xiao Zou,Ruifeng Yue,Yan Wang
DOI: https://doi.org/10.1109/edssc.2017.8126407
2017-01-01
Abstract:Based on a 30-um-thick N-type epitaxial layer doped at 3 x10(15) cm(-3), PiN diodes with etched junction termination extension (JTE) with floating guard rings (E-JFs) structure were designed and fabricated. Both the anode mesa and the JTE region were formed by ion implantation at 500 degrees C and etching process. The measurement results show that the fabricated PiN diodes can block reverse voltage of 3.6 kV with great uniformity and yield rate, and the forward voltage drop (I-A=100A/cm(2)) of 3.7 V is obtained.
What problem does this paper attempt to address?