A Lateral AlGaN/GaN Diode with MIS-Gated Hybrid Anode for Ultra-Low Turn-On and High Breakdown Voltage

Qi Zhou,Yu Shi,Changxu Dong,Liyang Zhu,Dong Wei,Xiaosen Liu,Wanjun Chen,Bo Zhang
DOI: https://doi.org/10.1149/2.0141711jss
IF: 2.2
2017-01-01
ECS Journal of Solid State Science and Technology
Abstract:In this paper, we propose and experimentally demonstrate a novel lateral AlGaN/GaN diode on Si substrate. The diode features a recessed metal/Al2O3/III-nitride (MIS)-gated ohmic hybrid anode, in which the drive current can be well controlled by the MIS-Gate and flows between the two ohmic contacts from the anode to the cathode with substantially reduced overall on-resistance (R-on). With this unique architecture, the forward turn-on voltage (V-T) of the diode can be flexibly trimmed, which enables a record low V-T of 0.2 V obtained in the proposed diode. The incorporation of high-k dielectric in the recessed gate region and the AlGaN back barrier realize significantly leakage current (I-leakage) reduction yet high breakdown voltage (BV). The BV as high as 1100 V at I-leakage less than 1 mu A/mm with drift length of 20 mu m is achieved in the proposed diode. (c) The Author(s) 2017. Published by ECS. All rights reserved.
What problem does this paper attempt to address?