High Reverse Blocking and Low Onset Voltage AlGaN/GaN-on-Si Lateral Power Diode With MIS-Gated Hybrid Anode

qi zhou,yang jin,yuanyuan shi,jinyu mou,xu bao,bowen chen,bo zhang
DOI: https://doi.org/10.1109/LED.2015.2432171
2015-01-01
Abstract:An AlGaN/GaN-on-Si lateral power diode with recessed metal/Al2O3/III-nitride (MIS)-gated ohmic anode for improved forward conduction and reverse blocking has been realized. The low onset voltage of $sim 0.6$ V with good uniformity for the fabricated 189 devices is obtained. In comparison with the conventional Schottky diode the specific ON-resistance ( $R_{mathrm {mathbf {mathrm{{scriptscriptstyle ON}},SP}}})$ was reduced by 51% in a device with anode-to-cathode spacing ( $L_{mathrm {mathbf {AC}}})$ of 5 $mu text{m}$ . The incorporation of high- $k$ dielectric in the recessed gate region enabling two-order lower reverse leakage comparing with the conventional device, leading to a high breakdown voltage over 1.1 kV at leakage current as low as 10 $mu text{A}$ /mm in device with $L_{mathrm {mathbf {AC}}}=20~mu text{m}$ . The strong reverse blocking over 600 V was still achieved at 150 °C. The proposed diode is compatible with GaN normally $mathbf {mathrm{{scriptstyle OFF}}}$ MIS high-electron-mobility transistors, revealing its potential for highly efficient GaN-on-Si power ICs.
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