Investigation of ionizing radiation mechanisms on HfO2-based ferroelectric thin-film memories with various configurations
Wanli Zhang,Guangliang Wan,Yanrui Lin,Junxiong Leng,Hongfei Wei,Lian Cui,Guangzhao Wang,Yanhu Mao
DOI: https://doi.org/10.1007/s10854-024-12033-5
2024-02-06
Journal of Materials Science Materials in Electronics
Abstract:The γ-ray total dose radiation effects on HfO 2 -based ferroelectric thin-film memories with various configurations were investigated. Electrical characteristics such as I– V , P– V , C– V , ε r – f , and fatigue properties of different capping electrodes, and diverse substrates of HfO 2 -based ferroelectric thin films were quantified before and after the radiation. It was found from I – V characteristics of all configurations that I increases with the voltage in the range of 0 to the forward coercive voltage ( V c + ), then it exhibited a reduction above V c + , after a dose of 1 Mrad (Si), which indicated a weakened built-in electric field or a decreased depolarization field was induced by the ionizing radiation. The P– V and C– V of all the configurations displayed a decrease after the radiation tests due to an enhanced pinned effect of switchable domains. The attenuation in ε r – f curves further certified the enhanced pinned effect of such configurations. A competitive relationship between the enhanced pinned effect and weakened built-in electric field was proposed to explain the performance evolution during the ionizing radiation. This work will be useful to better understand the radiation mechanism of HfO 2 -based ferroelectric thin-film memories.
engineering, electrical & electronic,materials science, multidisciplinary,physics, condensed matter, applied