Bistable Resistance Switching of Cu/Cu: HfO2/Pt for Nonvolatile Memory Application

Wang, Yan,Shi-Bing Long,Hang-Bing Lv,Liu, Qi
DOI: https://doi.org/10.1109/icsict.2010.5667568
2010-01-01
Abstract:The resistance switching characteristics of Cu doped HfO2 film are investigated for nonvolatile memory. Two stable states can be achieved under both pulse and DC electrical stress. Good performances including large storage window, fast operation speed, good endurance, and long time retention are shown in this device. The metallic filament is confirmed as the physical origin for resistance switching based on the temperature test.
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