Bistable Resistance Switching of Cu/Ti:ZrO2/Pt for Nonvolatile Memory Application

Qi Liu,Shibing Long,Qin Wang,Ming Liu,Sen Zhang,Junning Chen
DOI: https://doi.org/10.1149/1.3096426
2009-01-01
ECS Transactions
Abstract:Resistive switching characteristics of Ti doped ZrO2 films are investigated for nonvolatile memory applications. The devices are with a metal-insulator-metal structure adopting Ti doped ZrO2 films sandwiched between top Cu electrode and bottom Pt electrode. Both DC and pulse voltage can trigger the switching between high resistance state and low resistance state. The ratio between the high and low resistance can be on the order of 104 after more than 250 switching cycles. In voltage pulse mode, "write" and "erase" operation can be as fast as 5 ns and 100 ns, respectively. Furthermore, no data loss is found for more than 106 seconds. Finally, the switching mechanism is exploited and concluded to be related with the formation and rupture of conducting filamentary paths.
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