Robustly Stable Ferroelectric Polarization States Enable Long-Term Nonvolatile Storage against Radiation in HfO 2 -Based Ferroelectric Field-Effect Transistors

Siwei Dai,Qijun Yang,Binjian Zeng,Shuaizhi Zheng,Xiangli Zhong,Jinjuan Xiang,Jianfeng Gao,Jie Zhao,Jiajia Liao,Min Liao,Yichun Zhou
DOI: https://doi.org/10.1021/acsami.2c13392
2022-11-03
Abstract:The ferroelectric field-effect transistors (FeFETs) with HfO(2)-based ferroelectric layers in the gate stacks are emerging as one of the most promising candidates for the next-generation nonvolatile memory devices due to their scalability and compatibility with conventional Si technology. Moreover, owing to the high radiation hardness of the HfO(2)-based ferroelectric thin films, HfO(2)-based FeFETs have attracted great interest in the fields of radiation-hard (rad-hard) memory. However, the...
materials science, multidisciplinary,nanoscience & nanotechnology
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