Application of Chemical Vapor Deposited Diamond Film in Microwave Tube Fabrication

xie kuojun,liu shenggang
DOI: https://doi.org/10.3969/j.issn.1672-7126.2003.01.017
2003-01-01
Abstract:Diamond thick film has been successfully grown by microwave plasma chemical vapor deposition (CVD) on the surfaces of the Al 2O 3 substrate in the shape of a helix support,which can be used to replace that of the poisonous BeO ceramic in fabrication of wide band,high power travelling wave tubes (TWT).Experimental results show that the diamond film coated support have many advantages over the traditional BeO ceramic one,Such as high thermal conductivity,12 W/cm·℃;high dielectric constant ε =5 0 to 5 3;RF loss,tan δ <1×10 -3 ,and a bulk resistivity of 10 13 Ω·cm.And the thermal conducting property of the diamond film coated assembly is 3 times higher than that of the BeO ceramics with the same geometry.
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