Microwave plasma CVD of diamond films on high concentration alloys: Microstructure, hardness and wear properties

Zhen Zeng,Qun Zong,Shaoheng Sun,Yongsheng Wang,Yanxia Wu,Ke Zheng,Bing Zhou,Shengwang Yu
DOI: https://doi.org/10.1016/j.vacuum.2024.113078
IF: 4
2024-02-28
Vacuum
Abstract:Polycrystal diamond films were synthesized on high concentration alloys (HCAs) by microwave plasma chemical vapour deposition. It was found that the continuous diamond films formed in a short period, e.g., 10 min. The carbides including the stable MC [0 1 1] (M = Mo, Nb, Ta, Ti and Zr) and metastable carbides ( e.g ., Mo 2 C, Ti 2 C and Mo 3 C 2 ) were identified by X-ray diffraction and transmission electron microscopy. The diamond/carbide interface had an orientation relationship as [0 1 1] Diamond //[0 1 0] Mo2C . The hardness of MoHfNbTaTiZr HCA at the CH 4 concentration of 9% for 20 min was as high as 1238.2 HV 0.3 . The friction coefficient was 0.56–0.73 for the specimens with continuous diamond films. No spallation of films after friction indicated good wear resistance and adhesion.
materials science, multidisciplinary,physics, applied
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