Morphology and mechanical behavior of diamond films fabricated by IH-MPCVD

Rong Tu,Tiantian Xu,Dengfeng Li,Song Zhang,Meijun Yang,Qizhong Li,Lianmeng Zhang,Toshihiro Shimada,Takashi Goto,Ji Shi
DOI: https://doi.org/10.1039/c8ra01871e
2018-04-30
Abstract:Morphology of diamond films has been controlled via intermediate frequency induction heated microwave plasma chemical vapor deposition (IH-MPCVD), which was transformed with various substrate temperatures (T sub = 923-1123 K) and CH4/H2 ratios (η c = 0.5-2 vol%). The coupling effects of T sub and η c on the structure of diamond films have been studied. At η c = 0.5 vol%, the sp3/sp2 ratio of diamond films reached 98% at 1073 K, surface roughness (R ms) increased from 50 to 85 nm with increasing T sub, the maximum hardness (H a) reached 84 GPa at 973 K, and the maximum Young's modulus (E) reached 642 GPa at 1023 K. The residual stress (σ) was calculated as a function of T sub and η c. The quality factor (Q), combining microstructure and mechanical behavior, has been creatively defined to evaluate the quality of diamond films.
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