A Simple Method For High-Performance, Solution-Processed, Amorphous Zro2 Gate Insulator Tft With A High Concentration Precursor

Wei Cai,Zhennan Zhu,Jinglin Wei,Zhiqiang Fang,Honglong Ning,Zeke Zheng,Shangxiong Zhou,Rihui Yao,Junbiao Peng,Xubing Lu
DOI: https://doi.org/10.3390/ma10080972
IF: 3.4
2017-01-01
Materials
Abstract:Solution-processed high-k dielectric TFTs attract much attention since they cost relatively little and have a simple fabrication process. However, it is still a challenge to reduce the leakage of the current density of solution-processed dielectric TFTs. Here, a simple solution method is presented towards enhanced performance of ZrO2 films by intentionally increasing the concentration of precursor. The ZrO2 films not only exhibit a low leakage current density of 10(-6) A/cm(2) at 10 V and a breakdown field of 2.5 MV/cm, but also demonstrate a saturation mobility of 12.6 cm(2).V-1.s(-1) and a I-on/I-off ratio of 10(6) in DC pulse sputtering IGZO-TFTs based on these films. Moreover, the underlying mechanism of influence of precursor concentration on film formation is presented. Higher concentration precursor results in a thicker film within same coating times with reduced ZrO2/IGZO interface defects and roughness. It shows the importance of thickness, roughness, and annealing temperature in solution-processed dielectric oxide TFT and provides an approach to precisely control solution-processed oxide films thickness.
What problem does this paper attempt to address?