Fully CMOS Compatible 3D Vertical RRAM with Self-Aligned Self-Selective Cell Enabling Sub-5Nm Scaling

Xiaoxin Xu,Qing Luo,Tiancheng Gong,Hangbing Lv,Shibing Long,Qi Liu,Steve S. Chung,Jing Li,Ming Liu
DOI: https://doi.org/10.1109/vlsit.2016.7573388
2016-01-01
Abstract:In low cost vertical resistive switching memory (VRRAM), the inter-layer leakage becomes a serious problem, primarily resulting from the ultimate scaling in the vertical dimension. In this work, for the first time, we present a novel approach of fabricating 3D VRRAM using self-aligned self-selective RRAM to effectively address such challenge. By successfully suppressing the inter-layer leakage, the scaling limit of VRRAM could be extended beyond 5 nm. Other benefits, such as high nonlinearity (>103), low power consumption (sub-μA), robust endurance and excellent disturbance immunity, were also demonstrated.
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