Abstract:There is an urgent need in surface mount technology (SMT) for a nontoxic, reusable and low temperature bonding technique which can afford good mechanical support as well as electrical contact. Meanwhile in the nanotechnology, many excellent and unique structure-related properties such as the high mechanical strength, the high conductivity and the adhesion ability of gecko feet have been studied. Our lab proposes a new patterned structure of Au nanowire array named nanowire surface fastener (NSF), which cold bonding for surface mount technology can be realized at room temperature. Then various methods have been developed to fabricate nanowire, such as arc discharge, catalytic CVD growth and template synthesis, and so on. Among these methods, the template method has been widely used for preparing one-dimensional nanostructures such as metals, semiconductors, polymers, and other materials by electrochemical, electroless deposition or sol-gel technique. Especially anodic aluminum oxide template assisted way has attached considerable attention due to its unique structure properties, such as controllable pore diameter, extremely narrow pore size distribution with high densities, high aspect ratios, and ideally cylindrical pore shape. The well arranged porous anodic aluminum oxide membrane is fabricated from aluminum film by two steps zM oxalic acid electrolytes. The anodic aluminum oxide membrane was investigated for features such as pore size, interpore distance, and thickness by 40 V. It is important for fabrication of porous anodic aluminum oxide template to find out elimination of the barrier layer of oxide and the pore extending rate by 0.5 M phosphoric acid. Morphologies of surface of aluminum film between anodization process and the anodic aluminum oxide barrier layer was researched by using atomic force microscope and scanning electron microscope. Results showed that the anodic aluminum oxide having the same diameter of the pore and the well arranged pore array without branching channel was obtained. The diameter of the pore before the pore extending treatment is 42 nm and the diameter of the pore after the pore extending treatment for 30 minutes is 86 nm. It was found that the diameter of the pore increased per 15 nm by the pore extending treatment for 10 minutes. We fabricated the through-hole anodic aluminum oxide template and made Cu nanowire by the template of our own making. By using Cu nanowire, we try to produce nanowire surface fastener and evaluate its properties.

FEASIBLE METHOD TO FABRICATE A NICKEL-NANODOT MASK ON A SILICON SUBSTRATE WITH CONVENTIONAL THERMAL ANNEALING

Developing A Well-Adhered Ni/P Alloy Film On The Surface Of Silicone Elastomer For Shielding Electromagnetic Interferences

Fabrication of in Situ Ultrathin Anodic Aluminum Oxide Layers for Nanostructuring on Silicon Substrate

Fabrication of nanopatterned metal layers on silicon by nanoindentation / nanoscratching and electrodeposition

Phase-controlled Synthesis of Nickel Silicide Nanostructures

Preparation of High-Quality Colloidal Mask for Nanosphere Lithography by a Combination of Air/Water Interface Self-Assembly and Solvent Vapor Annealing

Fabrication of Anodic Aluminum Oxide Template and Cu Nanowire Surface Fastener

Development of a facile block copolymer method for creating hard mask patterns integrated into semiconductor manufacturing

Influence of Nickel Precipitation on the Formation of Denuded Zone in Czochralski Silicon

Monolayer Colloidal Mask with Tunable Interstice Size for Nanosphere Lithography

Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors

Fabrication of Silicon Hierarchical Nanopillar Arrays Based on Nanosphere Lithography

Fabrication of Nanostructures on Si Surface Using Gold Nanoparticle Mask

Fabrication of the Highly Ordered Silicon Nanocone Array With Sub-5 nm Tip Apex by Tapered Silicon Oxide Mask

GaN Nanopillars with a Nickel Nano-Island Mask

Fabrication of 10-nm Si pillars with self-formed etching masks

Fabrication of Silicon-Based Template-Assisted Nanoelectrode Arrays and Ohmic Contact Properties Investigation.

Fabrication of large-scale periodic silicon nanopillar arrays for 2D nanomold using modified nanosphere lithography☆

High Density Si Nanodots-Fabrication and Properties

Fabrication of GaN Nanocolumns with Semipolar Plane Using Ni Nano-Island Masks

Long-Range-Ordered Ag Nanodot Arrays Grown on Gaas Substrate Using Nanoporous Alumina Mask