Characteristics of multi-element (ZrTaNbTiW)N films prepared by magnetron sputtering and plasma based ion implantation

xingguo feng,guangze tang,xinxin ma,mingren sun,liqin wang
DOI: https://doi.org/10.1016/j.nimb.2013.03.001
2013-01-01
Abstract:•Multi-element films are prepared by combined magnetron sputtering and PBII.•XPS confirms ZrN, TiN, TaN, Nb–N, ZrO2, Ta, Nb and W in the nitride film.•Multi-element (ZrTaNbTiW)N films formed BCC and FCC phases.•Maximum hardness and elastic modulus of nitride films reached 13.5 and 178.9GPa.
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