Structure and properties of multi-targets magnetron sputtered ZrNbTaTiW multi-elements alloy thin films

Xingguo Feng,Guangze Tang,Mingren Sun,Xinxin Ma,Liqing Wang,Ken Yukimura

DOI: https://doi.org/10.1016/j.surfcoat.2012.05.038

IF: 4.865

2013-01-01

Surface and Coatings Technology

Abstract:We have studied the deposition of ZrNbTaTiW multi-elements alloy thin films on Si (111) substrates by multi-targets magnetron sputtering process. The chemical composition, constituent phase, grain morphology and hardness were investigated using XRF, XRD, FESEM and nano-indenter. The amorphous structure was formed in the film when the atomic percent of Zr exceeded 35%. The value of the hardness and modulus were in the range of 5.9 to 11.5 and 134.4 to190.4GPa, respectively. Both of the structure and property of multi-elements alloy films strongly depended on the films composition.