Chemical state and phase structure of (TaNbTiW)N films prepared by combined magnetron sputtering and PBII

Xingguo Feng,Guangze Tang,Mingren Sun,Xinxin Ma,Liqin Wang
DOI: https://doi.org/10.1016/j.apsusc.2013.05.001
IF: 6.7
2013-01-01
Applied Surface Science
Abstract:•(TaNbTiW)N films are prepared by combined magnetron sputtering and PBII.•A mixture of TaN, NbN, TiNxOy, TaOx, Ta and W is seen in the nitride film.•(TaNbTiW)N films formed BCC and FCC phases.•Maximum hardness and elastic modulus of nitride films reached 9.0 and 154.1GPa.
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