Strain Distributions in Non-Polar a-Plane InxGa1?xN Epitaxial Layers on r-Plane Sapphire Extracted from X-Ray Diffraction

zhao guijuan,yang shaoyan,liu guipeng,liu changbo,sang ling,gu chengyan,liu xianglin,wei hongyuan,zhu qinsheng,wang zhanguo
DOI: https://doi.org/10.1088/0256-307X/30/9/098102
2013-01-01
Chinese Physics Letters
Abstract:By using x-ray diffraction analysis, we investigate the major structural parameters such as strain state and crystal quality of non-polar a-plane InxGa1-xN thin films grown on r-sapphire substrates by metalorganic chemical vapour deposition. The results of the inplane grazing incidence diffraction technique are analyzed and compared with a complementary out-of-plane high resolution x-ray diffraction technique. When the indium composition is low, the a-plane InxGa1-xN layer is tensile strain in the growth direction (a-axis) and compressive strain in the two in-plane directions (m-axis and c-axis). The strain status becomes contrary when the indium composition is high. The stress in the m-axis direction sigma(yy) is larger than that in the c-axis direction sigma(zz). Furthermore, strain in the two in-plane directions decrease and the crystal quality becomes better with the growing of the InxGa1-xN film.
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