C and Si Ion Implantation and the Origins of Yellow Luminescence in Gan
L. Dai,G.Z. Ran,J.C. Zhang,X.F. Duan,W.C. Lian,G.G. Qin
DOI: https://doi.org/10.1007/s00339-003-2384-1
2004-01-01
Applied Physics A
Abstract:We have studied the influence of C and Si ion implantation with different implantation doses on yellow luminescence (YL) from GaN. Three kinds of GaN samples were used. In their as-grown states, #1 samples had strong YL, #2 samples had no YL, while #3 samples had weak YL. Our experimental results show that: (i) after annealing at 950 °C, the YL intensity for Si ion implanted #1 sample decreased with increasing implantation dose, while that for C ion implanted #1 sample exhibited a reverse rule; (ii) for #2 samples, C ion implantation produced much stronger YL than Si ion implantation did after annealing at 950 °C; (iii) the YL intensity sequence for Si ion implanted and 950 °C annealed #1, #2, and #3 samples was consistent with that for the unimplanted #1, #2, and #3 samples. However, the YL intensity sequence for the C ion implanted and 950 °C annealed #1, #2, and #3 samples reversed with that for the unimplanted ones. In order to explain all these phenomena, we suggested a physical model which claims that the deep C center is another important origin of YL in GaN, and during C ion implantation, the C ion prefers to combine with a VGa to form a CGa.