Sharp Bound and Free Exciton Lines from Homoepitaxial AlN

Martin Feneberg,Benjamin Neuschl,Klaus Thonke,Ramon Collazo,Anthony Rice,Zlatko Sitar,Rafael Dalmau,Jinqiao Xie,Seiji Mita,Ruediger Goldhahn
DOI: https://doi.org/10.1002/pssa.201000947
2011-01-01
physica status solidi (a)
Abstract:MOCVD AlN layers grown in c-direction on PVT bulk AlN substrates are investigated by high-resolution photoluminescence in the energy region of the band gap. The experiments allow for observation of different donor bound exciton lines with a full width at half maximum below 0.5 meV. Assignments are suggested for the substitutional shallow donors silicon and oxygen. The visibility of an excited state of the free exciton with a hole from the highest valence band allows to determine the exciton binding energy to 52.4 meV by use of a simple hydrogen model. The resulting band gap energy is 6.094 eV at 10K. Comparison with earlier reports on homoepitaxial AlN leads to a new identification of the bands reported there. (C) 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
What problem does this paper attempt to address?