Microstructure Of Hydrogenated Amorphous Silicon Layers Studied By Spectroscopic Ellipsometry For The Surface Passivation In Heterojunction Solar Cells

Wanwu Guo,Liping Zhang,Jian Bao,Fanying Meng,Yifeng Chen,Esther Lee,Zhiqiang Feng,Pierre J. Verlinden,Zhengxin Liu
DOI: https://doi.org/10.1109/pvsc.2015.7356329
2015-01-01
Abstract:The defect scatter interval (S-t) of a-Si:H/c-Si interface and void concentration (C-v) of a-Si:H were analyzed by Spectroscopic Ellipsometry (SE). The passivation performance of a-Si:H layers in SHJ solar cells was not only affected by the conductivity, but more importantly, it was strongly governed by the hydrogen content (C-H) in a-Si:H layers. In addition, the microstructure deduced from SE was in perfect accordance with the results revealed by TEM technique. Then, an implied open circuit voltage (V-oc,V-im) of 732mV was obtained when S-t was about 7fs and C-H around 7at.%
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