Dry Passivation Process for Silicon Heterojunction Solar Cells Using Hydrogen Plasma Treatment Followed by In Situ a-Si:H Deposition

Menglei Xu,Chong Wang,Twan Bearda,Eddy Simoen,Hariharsudan Sivaramakrishnan Radhakrishnan,Ivan Gordon,Wei Li,Jozef Szlufcik,Jef Poortmans
DOI: https://doi.org/10.1109/jphotov.2018.2871329
2018-11-01
IEEE Journal of Photovoltaics
Abstract:A fully dry and hydrofluoric-free low-temperature process has been developed to passivate n-type crystalline silicon (c-Si) surfaces. Particularly, the use of a hydrogen (H2) plasma treatment followed by in situ intrinsic hydrogenated amorphous silicon (a-Si:H) deposition has been investigated. The impact of H2 gas flow rate and H2 plasma processing time on the a-Si:H/c-Si interface passivation quality is studied. Optimal H2 plasma processing conditions result in the best effective minority carrier lifetime of up to 2.5 ms at an injection level of 11015 cm3, equivalent to the best effective surface recombination velocity of 4 cm/s. The reasons that enable such superior passivation quality are discussed in this paper based on the characterization of the a-Si:H/c-Si interface and c-Si substrate using transmission electron microscopy, high angle annular dark field scanning transmission electron microscopy, and deep-level transient spectroscopy.
energy & fuels,materials science, multidisciplinary,physics, applied
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