Modification to the Performance of Hydrogenated Amorphous Silicon Germanium Thin Film Solar Cell

Liu Bo-Fei,Bai Li-Sha,Wei Chang-Chun,Sun Jian,Hou Guo-Fu,Zhao Ying,Zhang Xiao-Dan
DOI: https://doi.org/10.7498/aps.62.208801
IF: 0.906
2013-01-01
Acta Physica Sinica
Abstract:In this paper, we study hydrogenated amorphous silicon germanium thin film solar cells prepared by the radio frequency plasmaenhanced chemical vapor deposition. In the light of the inherent characteristics of hydrogenated amorphous silicon germanium material, the modulation of the germanium/silicon ratio in silicon germanium alloys can separately control open circuit voltage (V0e) and short circuit current density (,/,) of a-SiGe:H thin film solar cells. By the structural design of band gap profiling in the amorphous silicon germanium intrinsic layer, hydrogenated amorphous silicon germanium thin film solar cells, which can be used efficiently as the component cell of multi-junction solar cells, are obtained.
What problem does this paper attempt to address?