Improvement in Performance of Hydrogenated Amorphous Silicon Solar Cells with Hydrogenated Intrinsic Amorphous Silicon Oxide P/i Buffer Layers

Jia Fang,Ze Chen,Ning Wang,Lisha Bai,Guofu Hou,Xinliang Chen,Changchun Wei,Guangcai Wang,Jian Sun,Ying Zhao,Xiaodan Zhang
DOI: https://doi.org/10.1016/j.solmat.2014.06.012
IF: 6.9
2014-01-01
Solar Energy Materials and Solar Cells
Abstract:In the study, we inserted different types of intrinsic and p-type layers as the p/i buffer layer in hydrogenated amorphous silicon (a-Si:H) solar cells and investigated their effects on device performance. The band gap and activation energy of the buffer layer had a significant effect on the open-circuit voltage (Voc) of the cells. Inserting a hydrogenated intrinsic amorphous silicon oxide (i-a-SiOx:H) layer as the p/i buffer layer in a-Si:H solar cells leads to a significant Voc increase up to 909mV. It also increased the external quantum efficiency at 400nm to 75%. This was primarily owing to the increase in the built-in electric field and a decrease in the rate of carrier recombination at the p/i interface. Finally, the initial conversion efficiencies of single-junction a-Si:H solar cell and hydrogenated amorphous silicon/hydrogenated microcrystalline silicon (a-Si:H/μc-Si:H) tandem solar cell could be increased to 10.64% and 12.24%, respectively.
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