Gd-implanted GaN As a Candidate for Spin Injector

V. Avrutin,U Ozgur,J. Xie,Y. Fu,F. Yun,H. Morkoc,V. I. Litvinov
DOI: https://doi.org/10.1117/12.646951
2006-01-01
Abstract:Due to their unique physical properties GaN-based heterostructures show a great promise for spintronics applications. This stimulates the search for GaN-based ferromagnetic semiconductors which can be used for injection of spin polarized carriers in device structures. In this study, magnetic properties of GaN layers implanted with Gd+ ions to various doses were investigated. Magnetization curves of samples with Gd content n(Gd) = 2x10(17) and 2x10(18) cm(-3) show clear hysteresis, while the samples with n(Gd) = 2x10(16) and 2x10(19) cm(-3) exhibit no ferromagnetism. Most likely, the lowest Gd concentration produced magnetization below the detection limit, whereas the absence of ferromagnetism in the sample with the highest Gd content may be resulted from heavy implantation-induced damage. Curie temperatures for samples with Gd contents of 2x10(17) and 2x10(18) cm(-3) were estimated to be larger than 300 K. Saturation magnetizations of 1550 mu(B) and 1350 mu(B) per Gd-atom were found at 5 K and 300 K, respectively, for the sample with n(Gd) = 2x10(18) cm(-3).
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