Abstract:Deposition of a consistent diamond coating on intricate surfaces has historically posed a difficulty. This article presents the advancement in research on depositing a uniform diamond coating on three-dimensional (3D) silicon spheres, utilizing a faraday cage within a microwave plasma chemical vapor deposition (MPCVD) reactor. A self-consistent three-dimensional multi-physics field model has been established for simulating the microwave electric field and plasma inside a reactor with or without a faraday cage. Results indicate the cage effectively reduces the discharge at the top of the silicon sphere and improves uniformity of the distribution of the microwave electric field and plasma electron density on the sphere's surface. MPCVD trials have demonstrated that a powerful discharge takes place at the apex of the silicon sphere resulting in an excessive thermal gradient if the cage is not added. The apex of the silicon sphere is covered with a blend of diamond and graphite phases. Due to the excessive internal stress of the coating, approximately 50 % of the samples experience coating detachment. After the addition of the cage, the strong discharge is transferred to the top of the cage, effectively suppressing the microwave electric field and plasma inside the cage. Improved quality, reduced internal stress, and enhanced uniformity of the polycrystalline diamond coating are achievable on the silicon spheres within the cage. Moreover, this technique offers a novel approach to coat diamond on complex 3D geometries.

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Approach of selective nucleation and epitaxy of diamond films on Si(100)

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Deposition of Silicon Carbon Nitride Film on Si (100) Substrates

Selected-Area Diamond Deposition On Si Substrates Pretreated In Different Ways

A Study of Interface Structure Between Diamond Film and Silicon Substrate

Growth of Diamond Films on Si3n4 Coated Silicon Substrates

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Enhanced Nucleation and Growth of Diamond Film on Si by CVD Using a Chemical Precursor

Deposition of Microcrystalline Diamond Films in H2 Microwave Plasma with Graphite Powder As Hydrocarbon Precursor

Deposition of uniform diamond films on three dimensional Si spheres by using faraday cage in MPCVD reactor

THE DEVELOPMENT OF MICROWAVE PLASMA CHEMICAL VOPOR DEPOSITION FACILITIES FOR DIAMOND FILMS

Morphologies and structures of chemical vapor deposited diamond films and film-substrate interfaces

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The Effect of Depositing Time on the Mpcvd of Diamond on Porous Carbon Monolith

Effects of the electric field at the edge of a substrate to deposit a Ø100 mm uniform diamond film in a 2.45 GHz MPCVD system

Diamond Deposition on WC–Co Substrate with Amorphous SiC Interlayer

Patterning of Diamond Microstructures on Si Substrate by Bulk and Surface Micromachining

Interfaces of CVD diamond films on silicon (001)