Effects of Substrate Temperature on Fractal of PVD Thin Film
ShanYingchun,Xu Jiujun,He Xiaodong,He Fei,Li Mingwei
DOI: https://doi.org/10.3321/j.issn:1002-185x.2007.z1.267
2007-01-01
Rare Metal Materials and Engineering
Abstract:Kinetic Monte Carlo method was applied to simulate the relationship between substrate temperature and the microstructure of the thin film fabricated by means of physical vapor deposition (PVD), and its surface topography was studied by fractal theory. Two phenomena were incorporated in the KMC model: adatom-surface collision and adatom diffusion. In the KMC simulation, Momentum Scheme was used to locate the initial location of adatom, activation energy was calculated by molecular statics (MS) calculations, and the algorithm was carried out by red-black tree. The results reveal that the fractal of thin film is less than 2.04 and thin film surface is smooth when substrate temperature is higher than 500 K. However, thin film fractal increases and surface become more and more rough with decreasing of substrate temperature when substrate temperature is lower than 500 K. When substrate temperature is 250 K thin film fractal is 2.32 and rough surface, fine rugosity and defect were achieved. The relationships between thin film fractal and substrate temperature indicate that higher substrate temperature is helpful to smooth film preparation with small fractal, however, thin film fractal is large and surface structure is complex when substrate temperature is lower. The study results agree with the study. of substrate temperature and surface roughness factor, which reveal that fractal is a way to evaluate thin film surface topography.