Absorption Behavior Of The Thin Silver Films Deposited On Fracture Surfaces Of Alpha-Al2o3 Ceramics

Yq Xu,Gx Ye,Xm Tao,Qr Zhang
DOI: https://doi.org/10.1117/12.190767
1994-01-01
Abstract:A new type of roughness silver thin films deposited on fractal surfaces of (alpha) -Al2O3 ceramics were prepared by rf- magnetron sputtering. The electrical properties of the Ag films are strongly dependant on the air pressure around the sample. When air pressure decreases to a certain value, a big jump of electrical resistant happens and the Ag thin film exhibits nonlinear I-V behavior. When releasing air into the vacuum chamber and the air pressure is raised, the film resistance restores to the primitive value and the nonlinear behavior then disappears.
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